Producing single-layer graphene is a manufacturing quality challenge. CSIR-NPL have designed a device that produce the right quality graphene to be used in next-generation quantum devices.
“Researchers at Delhi’s National Physical Laboratory (CSIR-NPL) have designed a low-pressure chemical vapour deposition (LPCVD) device that allows high quality, single-layer graphene measuring 4 inches in length and 2 inches in width to be grown. The quality of the single-layer graphene is metrology-grade, and can be used in next-generation quantum devices.
The thickness of a single layer is 0.34 nanometre and average grain size of graphene is 1-3 micro-metre. Though there are about one billion grains in 4×2 square-inch single-layer graphene, the grains are highly connected to give a single continuous layer of graphene.
The LPCVD device developed indigenously costs about Rs.5,00,000, which is one-tenth of the imported ones. More importantly, the quality of the single-layer graphene grown using this device is superior than the ones reported in the literature.
By growing single-layer graphene of high quality repeatedly for up to 30 times, the team led by Dr. Bipin Kumar Gupta from the Advanced Materials and Devices Metrology Division at NPL has demonstrated reproducibility. Results of the study were published in ACS Omega.
“We completed the development of the device and are ready to transfer the technology,” says Dr. Gupta. “Already a few research institutions in India have shown interest.” In fact, single-layer graphene grown by Dr. Gupta’s team has been used for a specific study for quantum hall resistance metrology at Tata Institute of Fundamental Research (TIFR) in Mumbai and the results of the work have been analysed for further communication in scientific journal.
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